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For
removing exposed resist during the positive photofabrication process.
- Disolves
exposed photoresist
- Concentrated
formulation - dilute one part developer to ten parts water
- For
best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
- Also
available in the M.G. Photofabrication Kit (Cat. No. 416-K) .
| Catalog
Number | Sizes
Available | Description |
| 418-500ML |
500 mL (17 fl. oz) |
Liquid |
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